21.03.2011

Finland-based Picosun starts production of fully automated HVM batch reactor for c-Si passivation

Atomic Layer Deposition (ALD) systems developed by Picosun are expected to have a major impact on the global photovoltaic industry.

Picosun Oy, Finland-based global manufacturer of Atomic Layer Deposition (ALD) systems, has launched production of fully automated high volume throughput batch reactors for crystalline silicon (c-Si) solar cell surface passivation. The ALD technology developed by Picosun is suitable for use in large-scale industrial applications.

 

According to Picosun, ALD has tremendous potential for performance improvement for all types and generations of solar cells in the photovoltaic (PV) industry. Especially the newer PV technologies based on dye, organic and thin film structures are in need of panel efficiency and lifetime improvement with simple, upscaleable and cost-efficient ways. ALD coated thin films in strategic locations of the solar cell or panel can reduce recombination, block impurities and harmful substances penetration into the cell, work as a corrosion protection or encapsulant, and replace poisonous or expensive cell materials.

 

"This generation of novel fully automated batch ALD tools is already in the process of changing the economics for ALD mass production in the photovoltaic industry," says Juhana Kostamo, Picosun's managing director. According to Picosun, 2011 is predicted to become the breakthrough year for many industrial scale applications of ALD. The market and installation figures for solar power have been increasing rapidly in recent years.

 

Picosun Oy is based in Espoo, Finland, and its production facilities are located in Kirkkonummi, Finland. The company’s headquarters in the United States are in Detroit. Picosun Oy is part of Stephen Industries Inc Oy.

 

Source: Picosun Oy